P Channel vs N Channel JFET: Explained
What is a JFET?
JFETs are available as N-type or P-type devices, which operate under opposite applied voltage conditions. JFETs are fabricated with the substrate of the device serving as the gate, with the channel fabricated as a layer on top of the substrate. A N-type JFET has a substrate of a semiconductor doped as P-type with N-type doping applied to the channel region, and a P-type JFET consists of a N-type substrate with a P-type channel.
JFETs operate by a similar mechanism to that of a reverse biased PN-junction, where when a diode is subjected to a positive potential difference from the N-type area to the P-type area, a depletion region will form, and no significant amount of current will be conducted between the two terminals excluding a very small leakage current.
This property is utilized in JFETs as a means of constricting the channel to reduce the current conducting from the drain to the source, where in N-type JFETs if a positive voltage is applied across the Drain to the Source \left(V_{DS} \ge 0 \right), and a voltage less than or equal to zero is applied across the Gate to the Source \left(V_{GS} \le 0 \right), the depletion region created at the junction will be adjusting the positive Drain current \left(I_D \ge 0 \right). Conversely for a P-type JFET, if a negative voltage is applied across the Drain to the Source \left(V_{DS} \le 0 \right), and a voltage greater than or equal to zero is applied across the Gate to the Source \left(V_{GS} \ge 0 \right), the depletion region will vary the negative Drain current \left(I_D \le 0 \right). Figure 4 shows a comparison between a N-type JFET that is fully conducting \left(V_{GS} = 0 \right) and a partially conducting one \left(V_{GS(OFF)} \lt V_{GS} \lt 0 \right).